To conduct scientific experiments, the Laboratory uses a network access to the Computer-Aided Plasma Installation for technological purposes developed on the basis of the DC Magnetron Sputtering System (MSS) which generates the sputtering target atom flows precipitating on the substrates. The MSS provides the application of high quality multi-component drip-free coatings and produces thin nano-films with preset physical properties. The magnetron discharge is performed in a broad range of pressures of almost any plasma generating gases.